Materials Research Express
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Atomic layer deposition of ultra-thin and smooth Al-doped ZnO for zero-index photonics
Recent citations - Emerging investigators in materials science 2017–2018 Frank W DelRio and Robert A Riggleman
To cite this article: Aleksei Anopchenko et al 2018 Mater. Res. Express 5 014012
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Mater. Res. Express 5 (2018) 014012
https://doi.org/10.1088/2053-1591/aaa653
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1 December 2017 REVISED
26 December 2017 ACCEPTED FOR PUBLICATION
9 January 2018 PUBLISHED
24 January 2018
Atomic layer deposition of ultra-thin and smooth Al-doped ZnO for zero-index photonics Aleksei Anopchenko1 1 2
, Sudip Gurung1, Long Tao1, Catherine Arndt1 and Ho Wai Howard Lee1,2
Department of Physics, Baylor University, Waco, TX 76798, United States of America The Institute for Quantum Science and Engineering, Texas A&M University College Station, TX 77843, United States of America
E-mail:
[email protected] and
[email protected] Keywords: epsilon-near-zero, atomic layer deposition, plasmonics, aluminum-doped zinc oxide, nanophotonics
Abstract We report fabrication of smooth Al-doped ZnO (AZO) films
