Diamond Nucleation of Surfaces Using Carbon Clusters

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carbon, soot, etc. it is found that the nucleation density on C70 is equivalent to that of diamond seeds themselves. On the other hand, diamond nucleation of C6 ...
AD-A264 634 OFFICE OF NAVAL RESEARCH Grant # N0001489J 1848 R&T Code 413u002

Technical Report No. 12 Diamond Nucleation on Surfaces Using Carbon Clusters by

D T IC ELECanE SELECTE

prepared for publication in the

MAY 1 81993

A

R.J. Meilunas, R.P.H.

D

Journal of Materials Research

Northwestern University Dept. of Materials Science and Engineering, Evanston, IL 60208

May 1993

Reproduction in whole or in part is permitted for any purpose of the United States Government

This document has been approved for public release and sale; its distribution is unlimited

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May 1993

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4. TITLE AND SUBTITLE

3.

REPORT DATE

REPORT TYPE AND DATES COWVRIO

Technical S•. FUNDING NUMBERS

Diamond Nucleation on Surfaces Using CarbIon Clusters

G NOOOI489J1848 R&T code 4 13uO02

6. AUTHOR(S)

R.J. Meilunas,

R.P.H. Chang B. PERFORMING ORGANIZATION REPORT NUMBER

7. PERFORMING ORGANIZATION NAME(S) AND ADDRESS(ES)

Materials Science & Engineering Dept. Northwestern University 2225 Sheridan Road 60208 Evanston, IL

Technical Report #12

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9. SPONSORING MONITORING AGENCY NAME(S) AND ADDRESS(ES)

Chemis try Division

AGENCY REPORT NUMBER

Office of Naval Research 800 N. Quincy Street Arlington, VA 22217-5000 11. SUPPLEMENTARY NOTES

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"13. ABSTRACT

(Maximum 200 words)

Thin solid films of Ce and C7 have been used as nucleation layers for the growth of diamond thin films on a variety of substrate surfaces, including metal, insulator and semiconductors. Compared to other forms of carbon, such as graphite, amorphous carbon, soot, etc. it is found that the nucleation density on Ca is equivalent to that of diamond seeds themselves. On the other hand, diamond nucleation of C. is less favorable. We argue from our experiments that the reason for C- to have such favorable nucleating properties is its chemical stability and geometry. A working model is proposed to explain the nucleation of diamond on solid C0 films. Application of this work extending to the growth of diamond on a wide range of substrates is also discussed.

14, SUBJECT TERMS

Diamond Nucleation;

carbon clusters

15. NUMBER OF PAGES

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Is

Diamond Nucleation on Surfaces Using Carbon Clusters R.J. Meilunas* and R.P.H. Chang Dept. of Materials Science and Engineering 60208 Northwestern University, Evanston, IL ABSTRACT Thin aolid films of C6 layers

for the

growth of

substrate surfaces,

and C7 diamond

is

soot,

etc.

thin

films

on

a variety

of

including metal, insulator and semiconductors.

Compared to other forms of carbon, carbon,

have been used as nucleation

it

is

such as graphite,

amorphous

found that the nucleation density on C70

equivalent to that of diamond seeds themselves.

On the other

hand, diamond nucleation of C6 is less favorable. We argue from our experiments

that

the

nucleating properties

reason is

its

for

C70

to

have

such

favorable

chemical stability and geometry.

A

working model is proposed to explain the nucleation of diamond on solid C7. films. Application of this work extending to the growth of diamond on a wide range of substrates is also discussed. Accesio!', Fri, NTIS CRA&I D IC TA3 Undnrounced

E

Ju~thcation

By.Dist. ibnti,,•

A

I

zI , '3

e

I. Introduction

The success in growing thin diamond films using chemical vapor deposition properties

methods of

potentially

for

diamond

unique

the

in

interest

stimulated

has

technological

new

applications. As an example, diamond has the combined properties of good

electrical

high

insulation,

well suited for use in

dielectric constant which make it

packaging and multi-chip module technologies. wide

and

optical

diamond

of

bandgap

device

The extreme hardness

would

provide

also

an

optical

oxcellent protective coating material for a variety of

applications. The chemical inertness and hardness of diamond films would also find wide utilization as a protective against corrosion and wear

low

and

conductivity

thermal

thin

coating

in the cutting tool and metal working

industries. A

number

different

to deposit

developed problem

of

deposition

diamond

thin

have

techniques

films.'I 2 -3 "4-5

A fundamental

most deposition methods is

encountered in

been

the limited

understanding and controllability of diamond nucleation on nondiamond substrates.

the most common method to obtain

At present,

substantial nucleation of diamond on non-diamond substrates is pretreatment

step.

accomplished by

This

simply

paste before placing it type of diamond seeding,

pretreatment

procedure

is

a

regularly

polishing the sample with diamond grit or in the deposition chamber.

Without some

not enough diamond crystallites nucleate 2

on

the surface of most materials in a reasonable amount of time to

eventually

grow

and

coalesce

into

continuous

films.

Such

pretreatments are also not easily adapted towards coating large or non-planar surface areas. In

this paper we provide a more comprehensive discussion on

the nucleation method described technique

in an earlier publication

eliminates the need for surface abrasion

6

. This

and diamond

seeding by usirg thin layers of fullerene films sublimated onto various non-diamond substrates. The thin fullerene layer produces a large number of nucleation sites suitable for the formation of continuous diamond films. The specificity of the type of fullerene is found to aid in elucidating the mechanism for diamond nucleation in

low pressure CVD.

I1.

Background

Detailed abrasion

and

experimental seeding

with

studies of the effects diamond

grit

have

of

been

substrate reported.

7

Recently, using high resolution transmission electron microscopy, Iijima et al a have demonstrated the effects of substrates on diamond nucleation. extensive cleaning

polishing the Si

They observed that even after

of the diamond grit polished Si substrates,

small "diamond dust " particles of nanometer size remain on the Si surface. The dust particles act as seeds for diamond nucleation on the substrate.

This represents more of a form of homoepitaxy on

isolated, randomly oriented,

single crystal diamond than any type

of heteroepitaxy. Earlier reports of enhancing diamond nucleation on unpolished, limited and

non-diamond substrates by various methods have been

inconclusive about nucleation mechanisms. These include enhancement like carbon films 9

with the use of diamond plasmas 11

fluorinated

and

derivatives 13

thin

,

even

dc biasing 10

,

overlayers 12

metal

with

However,

.

fingerprints 14

perylene

P

the

exception of dc biasing, none of the above methods has produced as significant a degree of nucleation enhancement as that obtained by of polishing with diamond grit.

the simple method

studies have proposed possible diamond

Various theoretical

forming precursors on which to nucleate

compounds as possible diamond cluster embryos included adamantane, dodecahedrane.

cage

or "seeds" which

hexacyclopentadecane and

tetracyclododecane,

The adamantane

Matsumoto and

hydrocarbon

several

to identify

were the first

Matsui 15

diamond.

represents

CIOH 16 ,

molecule,

the

-smallest combination of carbon atoms which possess the diamond unit structure (three six membered rings in a chair coordination).

The

and

were

represent

compounds

other proposed

as

the

precursors

twinned to the

diamond five

embryos twinned

fold

diamond

microcrystals which are found prevalent in CVD diamond thin films. From

simple

atomic

generate the diamond lattice compounds by simple

comparisons,

structure

hydrogen

from

the

above

abstraction

thermodynamic

molecules to

unstable in the

quite

4

hydrocarbon

followed

considerations

addition. Nevertheless, be

one can easily

harsh

by

cage carbon

show these

environment used

( > 600C

),

reducing

such

low

the

high

in

environment used to grow CVD

finds that the favorable enthalpies of formation

Stein 17

diamond.

stable

hydrocarbons are not

molecular weight temperature

find that

and Stein 17

et al. 16

of Godleski

equilibrium calculations

Thermodynamic

films.

to grow diamond

of such diamond forming precursors as adamantane,

diadamantane and

cyclohexane are overwhelmed by unfavorable entropies of reactions Above this temperature,

above 500 K.

the corresponding graphite

precursors (polycyclic aromatics) are found both theoretically and experimentally

to

be

more

stable.

addition,

In

below

this

temperature calculations show these diamond-like molecules to be unstable with respect to dissociation into methane and other small molecular weight gas species. Angus et al.

18-19

have,

in turn, proposed various saturated

multiple fused ring compounds ( with structures representative of nascent parallel -precursors.

twin planes of diamond

Such

"graphite

precursor"

hydrocarbon flame and combustion literature

)

as possible

as

described 20,

21,

diamond in

the

are stable in

the high temperature reducing atmosphere of CVD diamond growth. no published reports have appeared of successfully using

However,

such aromatics to nucleate diamond. On the contrary, Frenklach and Wang

22 ,

in a detailed chemical kinetics model of a hot filament CVD

reactor, find that in the operating parameters typical for diamond deposition,

atomic

hydrogen

suppresses

the

formation

of

such

aromatics. More

recently,

Shen et al. 2 5

have modelled diamond

based

precursors

a

employing

finite cluster

approximation

approach.

This theoretical model investigates carbon cluster fragments of the diamond lattice which are saturated by hydrogen atoms,

so called

adamantane based or polymantane derived carbon clusters. Ab initio quantum

mechanical

are

computations

used

to

the

investigate

convergence behavior of the properties of the clusters toward the properties

bulk diamond.

of

clusters of up to only is

C3H.

Although

stable polymantane

based

reference

are calculated and little

made to the stability of such molecules in the CVD environment approach to the problem has much

used to grow diamond films, the

relevance to the results described in this report. Several

detailed

studies

on

the

nucleation

mechanism

of

diamond on silicon and metal surfaces have been reported recently. Stoner et al 24 have made an in depth study of diamond nucleation on silicon using a biasing technique developed by Yugo et al 10 in which a negative potential is applied to the substrate with respect -to the plasma to enhance carbon ion bombardment of the surface during the nucleation stage. The carbon ions are found to initially form an amorphous silicon carbide layer on the substrate surface. However,

continued carbon ion bombardment results in preferential

etching of the silicon from the Si-C layer and/or continued high flux of carbon

to the surface.

This excess carbon is

postulated

for diamond nucleation.

The

molecular or structural arrangement of such carbon sites is

not

to form small

"clusters" favorable

described. Belton and Schmieg 2 have studied the nucleation of diamond on 6

platinum and nickel substrates using hot filament chemical vapor

electron

combination

X-ray

of

electron energy loss spectroscopy, and

photoelectron spectroscopy, low energy

a

experiments,

these

In

information.

structural

site

nucleation

elucidated

have

and

deposition

was

diffraction

used

the

to examine

time These

evolution of surface carbon species during diamond growth.

results indicate that diamond nucleates on platinum and nickel by

They postulate

surfaces.

scratched

carbon

graphitic

of

pre-deposition

on mechanically

precursors that defect

sites

in

graphite deposits contain the nucleation sites for diamond. al

26

these Ong et

have observed similar results from nucleation and growth of

diamond crystals on single-crystal copper surfaces implanted with carbon ions. This study shows that during diamond growth on carbon microwave plasma CVD,

implanted copper using

a polycrystalline

graphite film initially forms on the copper surface. This graphitic layer is

found to

enhance

nucleation of diamond on copper.

the

-This study concludes with a simple lattice model for diamond growth on graphite which is di.d

From conditions on is

dimod

pazuillel to grate

one

can

postulate

several

necessary

must be met to help enhance diamond nucleation

(1) a structured, pure

carbon source on the

necessary to act as a diamond seed. Pure carbon,

from

surface simple

thermodynamic equilibrium considerations 21 would be inherently more stable than any hydrocarbon molecule at typical CVD diamond growth conditions;

(2)

the need for the structured carbon source to be 7

both air stable to

facilitate application and durable enough to

withstand to a degree the environment in which plasma enhanced CVD of diamond takes place; source

to have steps

sites;

and

(4)

(3)

or

the need for the structured carbon

ledges to serve as diamond

finally,

to have a means of

nucleation

initiating diamond

nucleation from the gas phase during the CVD process. Advances by Kraetschmer et al

27

in

scale quantities of air stable pure C6

the synthesis of gram

and C.

and other

even

larger fullerenes now enable the practical experimental study of the utility

of carbon clusters as diamond nucleating agents.

addition to fulfilling the

requirements

In

stipulated above for a

good diamond nucleating agent, C., and C0 clusters are unique from other types of carbon precursors previously studied major respects.

in two other

The fullerenes are a highly ordered allotrope of

pure carbon which is

easily formed into thin solid films by

simple low temperature sublimation process.

a

Unlike many proposed

-hydrocarbon based diamond precursors, these cluster solid films are also found to be chemically stable up to the temperatures at which diamond is

found to grow.

in

C70

temperature approaching 600 0 C,

which is

limit for CVD diamond synthesis. results

of

attempts

to

enhance

substrates with the use of

IZI.

particular,

has a sublimation

a typical low temperature

We report in the

nucleation

this paper the of

C6 and C. fullerene films.

RZXeDliontal Procedure

8

diamond

on

Debcription of Microwave Plasma CVD Reactor

A.

A microwave enhanced plasma chemical vapor deposition system was designed ane constructed for the purpose of depositing high purity diamord thin films. A schematic of the deposition system is The microwave energy operating at a frequency

shown in Figure 1.

directed to the CVD reactor

of 2.45 GHz is waveguide,

through a circular

then launched into the chamber through a quartz window.

The substrate holder consists of a quartz tube with an annular cap, is

which either

used to keep the sample in graphite,

quartz,

particular experiment.

or

boron

place. nitride

made of

The cap is

on

depending

the

In this configuration the sample iq floating

with respect to the plasma when no bias potential is applied. Bias with respect to the plasma is made via platinum foil in mechanical contact with the back of the sample. B.

C6 and C70 Separation and Their Properties

Purified forms of C6,

C7,,,their various derivatives and other

-higher number carbon clusters were prepared by Shengzhong Liu in the Department of Chemistry at Northwestern University. C6. and C. were obtained from carbon soot, prepared by graphite evaporation in a helium atmosphere

26,29

. The clusters were first

recovered from

the soot by soxlet extraction. Separation of the C6 and C7 clusters was achieved

by dispersing the extracted material

column of active alumina, hexane,

and eluting with hexane,

and finally 20% toluene in hexane 3

on top of a 5% toluene in

. The purity of the

resulting C6 and C. fractions was confirmed by electron impact mass spectroscopy,

which

showed the

C7. fraction 9

slightly

(