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© 2001 OSA/OIC 2001
Dual magnetron sputtering for optical coatings J. Struempfel, G. Teschner, C. May VON ARDENNE ANLAGENTECHNIK GMBH Plattleite 19/29 D-01324 Dresden Germany Tel. +49 351 26 37 350 Tel. +49 351 26 37 308 e-mail
[email protected] Abstract Dual Magnetron sputtering is applied for deposition of optical multilayers in a vertical in-line coater. The reactive sputter process for SiO2, TiO2 and Nb2O5 films is controlled by PEM. Single and multiple pass mode are considered with regard to the productivity.
Oral presentation is preferred Keywords Thin films, Deposition and fabrication Optical devices, Multilayers