Formation of CH3NH2-incorporated intermediate

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Formation of CH3NH2-incorporated intermediate state in CH3NH3PbI3 hybrid perovskite thin film formed by sequential vacuum evaporation. Min-Cherl Jung1,* ...
Supplementary Material

Formation of CH3NH2-incorporated intermediate state in CH3NH3PbI3 hybrid perovskite thin film formed by sequential vacuum evaporation Min-Cherl Jung1,*, Sora Kobori1, Asuka Matsuyama1, Inhee Maeng2, Young Mi Lee3, Hirotaka Kojima1, Hiroaki Benten1, and Masakazu Nakamura1 1

Division of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara, 630-

0192, Japan 2

Advanced Photonics Research Institute, Gwangju Institute of Science and Technology,

Gwangju, 61005, Republic of Korea 3

Beamline department, Pohang Accelerator Laboratory, POSTECH, Pohang, 37673,

Republic of Korea

*

Corresponding author: [email protected]

Figure S1. O 1s core-level spectra of the B: 3 and C: 6 Å/s samples. The small trace is due to the transfer from the evaporation chamber to the XPS chamber. From the signal-to-noise level, we can confirm there is no any oxygen-incorporated state.

Figure S2. AFM measurements of PbI2 thin films with different deposition rate.

Table S1. The measured thickness of PbI2 thin films with different deposition rate. We used the surface profiler and the target thickness using the thickness monitor sensor was 200 nm. MEASUREMENT

1 Å/S

3 Å/S

6 Å/S

10 Å/S

1

288.51

285.58

330.72

326.62

2

282.56

286.26

325.13

338.00

3

288.97

289.80

320.71

352.67

4

289.97

290.17

321.26

353.90

AVERAGE

287.50 nm

287.95 nm

324.46 nm

342.80 nm