X-Ray Photoelectron Spectroscopy (XPS) - Google Groups

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Invitation to Advanced Failure Analysis and Material Analysis Seminar. X-Ray Photoelectron ... simplicity in use and dat
Invitation to Advanced Failure Analysis and Material Analysis Seminar

X-Ray Photoelectron Spectroscopy (XPS) 10 March 2015: 9.00am – 5.30pm What Is XPS XPS: X-Ray Photoelectron Spectroscopy ESCA: Electron Spectroscopy for Chemical Analysis XPS, also known as ESCA, is the most widely used surface analysis technique because of its relative simplicity in use and data interpretation. The sample is irradiated with mono-energetic x-rays causing photoelectrons to be emitted from the sample surface. An electron energy analyzer determines the binding energy of the photoelectrons. From the binding energy and intensity of a photoelectron peak, the elemental identity, chemical state, and quantity of an element are determined. The information XPS provides about surface layers or thin film structures is of value in many industrial applications including: polymer surface modification, catalysis, corrosion, adhesion, semiconductor and dielectric materials, electronics packaging, magnetic media, and thin film coatings used in a number of industries.

Fig. 1: X-ray beam induced secondary electron image and survey spectra from selected areas on a contaminated polymer surface that show the presence of fluorine in the contaminated area.

Fig. 2: High resolution carbon 1s spectra from the same selected areas that show the presence of a fluorocarbon contamination in localized areas on the polymer surface.

Fig. 3: Secondary electron image showing a selected area for XPS imaging and a color overlay image of carbon and fluorine 1s maps that confirm the presence of a localized fluorocarbon surface contaminant.

Date/Time:

10 March 2015 (Tuesday) 9.00 am to 5:30 pm

Venue:

MIMOS BERHAD, Technology Park Malaysia, 57000 Kuala Lumpur.

Agenda 8.30 - 9.00am

Registration

9.00 - 9.10am

Welcome Address

9.10 - 9.30am

Introduction to Surface Science Technology ● Auger ● XPS ● ToF-SIMS ● D-SIMS Speaker : Mr Nobuaki Urushihara Introduction to ESCA/XPS ● Fundamental Principle & Theory

9.30 - 10.45am

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Photoelectron emission Qualitative analysis Nomenclature of Photoelectron Quantitative analysis Instrumentation of XPS Merit of monochromated XPS Chemical state analysis using XPS Chemical shift in XPS Auger electron peak in XPS spectrum XPS chemical mapping Basic Principle Of Depth Profiling Gas Cluster Ion Beam Technology For Organic Depth Profiling

Speaker : Dr Noriaki Sanada 10.45 - 11.00am

11.00 - 12.00pm

Refreshment Basic Guideline Analyze/Read XPS Data Important Applications of XPS ● Polymer ● Biomed ● Semiconductor ● Solar Speaker : Dr Noriaki Sanada

Seminar Fees & Payment

12.00 - 12.45pm

Quantera II ● Introduction on Quantera II ● Advantages of Scanning XPS Microprobe ● Advantages of Dual Beam Charge Neutralisation ● Depth Profiling Capabilities via Argon Gun ● Polymer Depth Profiling Capabilities via GCIB Gun ● Automated Analysis Capabilities Speaker : Mr Nobuaki Urushihara

12.45 - 14.00pm

Lunch

14.00 - 14.30pm

MIMOS Presentation – FA Shared Services Presenter : MIMOS Team

14.45 - 17.30pm

Lab Demo - XPS

Speaker 1 Dr. Noriaki Sanada was born and educated in Japan, where he was granted Doctor of Science (Chemistry) at Tohoku University. After several years at Analytical Laboratory of Mitsubishi Chemical Industry, and Research Institute of Electronics, Shizuoka University, he joined ULVAC-PHI and spent about 10 years as a laboratory manager. He is currently Senior Staff Manager of Technical Support Department of ULVAC-PHI, Japan.

Speaker 2 Mr Nobuaki Urushihara was born and educated in Japan, where he was granted MS (Engineering), Applied Physics in 2000. He joined Ulvac Phi in 2000/20001 as scientist mainly conducting spectroscopy analysis & research mainly in electron spectroscopy until 2008. Since 2008 until now, he is engaged in sales for Japan and South East Asia region.

Industry 

Academia

RM 100 per participant

Group Discount (more than 3 participants per company) 



Student – RM 30 per participant



Lecturer & Staff – RM 50 per participant

RM 80 per participant . Payment Details Crossed cheque to: MIMOS BERHAD – Wafer Fab OR Bank transfer to MAYBANK account: 51-214-704531-4 Enquiries & RSVP Ms. Amy Letchumy or Mr. YH Soon for more details on the seminar: [email protected] or [email protected] Or Tel: +603 8995 5000 Ext: 55642/56252 Fax: +603 8991 4345

Your attendance and participation are anticipated with much enthusiasm and appreciation. Registration form attached with this invitation. Registration Deadline: 8 March 2015 (Sunday)

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