Sep 4, 2017 - S. Franssila, Introduction to Micro Fabrication. Wiley, 2004. ... Microelectronic Engineering 87 (2010) 1711â1715 .... 2nd Resist Spin-coating.
Nanofabrication technologies for nanophotonics Igor Ozerov Aix-Marseille Univ, CNRS, CINaM 13288 Marseille France
Igor OZEROV
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Monday 4th September 2017
Relative precision of nanofabrication
1% Igor OZEROV
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Image: M. Madou, ‘Fundamentals of microfabrication’
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Nanomanufacturing
Imboden and Bishop, Top-down nanomanufacturing, Physics Today 67, 45 (2014) Igor OZEROV
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Plan • Introduction (top-down processes) – – – –
• • • • • • •
Deposition Etching Lithography Focused electron and ion beam tecniques
Exemples plasmonic Exemples chiral structures Dielectric photonics, silicon Exemples, coloration Nanosphere lithography (bottom-up) Laser-driven methods Nanofabrication using vortex beams
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Nano- et micro- fabrication approaches
Igor OZEROV
Top-Down
Bottom-Up
micromachining from bulk to nano
growth and assembly of nano-objets
Summer School on Plasmonics 4
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Monday 4th September 2017
Deposition (additive technics)
Magnetron sputtering (Al, Cr, Ti & W) Reactive sputtering (nitrides and oxides) in gas environment Igor OZEROV
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Evaporation (Ag, Al, Au, Cr, Cu & Ni) in vacuum
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Magnetron Sputtering substrate
ee-
plasma ee-
e-
e-
magnet Igor OZEROV
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Step coverage in sputtering and evaporation deposition
S. Franssila, Introduction to Micro Fabrication. Wiley, 2004 .
Igor OZEROV
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Monday 4th September 2017
Nanocones by Directional Evaporation
J.M. Kontio et al. / Microelectronic Engineering 87 (2010) 1711–1715 Igor OZEROV
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Monday 4th September 2017
Top-Down Approach Typical steps Deposition
Litho
Cleaning
Nanofabrication Etching
Carac terisation
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Dry Plasma and Wet Etching Wet Chemical Etching Reactive Ion Etching (RIE) by Plasma gases: CHF3 SF6 O2 materials : Si SiO2 Si3N4 TiO2 WO3
Capacitively (CCP) and Inductively coupled plasma (ICP) Argon ion milling
High aspect ratio reactive ion etching of silicon
Igor OZEROV
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Monday 4th September 2017
Dry Plasma and Wet Etching mask
Isotropic wafer
(Example wet : Au in KI3)
Anisotropic Example wet : Si in KOH Example dry : Si by SF6:O2
wafer
Igor OZEROV
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Reactive Ion Etching Formation of active species in plasma Elimination of volatile products
e-
e-
plasma Surface chemical reactions
Igor OZEROV
e-
Summer School on Plasmonics 4
Surface Desorption
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Reactive Ion Etching of Si
Igor OZEROV
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Monday 4th September 2017
Alcaline Wet Etching of Silicon
Igor OZEROV
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Monday 4th September 2017
Crystalline silicon nanostructures KOH or TMAH ? KOH {110}>{100}>{111}
TMAH {100}>{110}>{111}
Selective chemical etching, Cr/Au mask J. Proust, F. Bedu, S. Chenot, I. Soumahoro, I. Ozerov, B. Gallas, R. Abdeddaim, and N. Bonod, Advanced Optical Materials, vol. 3, pp. 1280-1286, 2015. Igor OZEROV
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Focused Ion Beam Milling Focused ion beam Ga+ @ 30kV Etched atoms
retrodiffused Ga ions
Nanohole array in a SiC crystal
Images: Frédéric BEDU Igor OZEROV
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Monday 4th September 2017
Local Focused Ion Beam (FIBID) and Electron Beam Induced Deposition (EBID) beam
Precursor gas
Tungsten nanodots deposition (EBID) Igor OZEROV
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Monday 4th September 2017
Local Electron Beam Induced Deposition (EBID)
W nanowire
Courtesy Frédéric Bedu and Marion Descoins Igor OZEROV
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Top-Down Approach Typical steps Deposition
Litho
Cleaning
Nanofabrication Etching
Carac terisation
Igor OZEROV
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Monday 4th September 2017
UV and e-beam lithography UV Resist
O2
Mask
Scanning electron or ion beam
1) Plasma cleaning
2) Spin-coating
3) « SOFT » bake 4) Alignement and exposure
5) Post-exposure bake 6) Developpment
7) « HARD » bake 8) Inspection
Igor OZEROV
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Monday 4th September 2017
Electron beam lithography System Pioneer (RAITH)
Field Emission Gun (FEG) 2nm Laser interferometer Stage Stitching and Alignement
Plasmonic color printing
gap ->
Kumar, Duan, Hegde, Koh, Wei & Yang Nature Nanotechnology, 7, 557–561 (2012) Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Plasmonic Dual-State Nanopixels
Nanofabrication using : metal-evaporation of aluminum film electron-beam lithography reactive ion etching and inductively coupled plasma deposition
Heydari, Sperling, Neale, and Clark Adv. Funct. Mater. 2017, 1701866
Igor OZEROV
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Monday 4th September 2017
Switchable QR-code
Bright-field and SEM images of a switchable QR-code
Heydari, Sperling, Neale, and Clark, Adv. Funct. Mater. 2017, 1701866 Igor OZEROV
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Monday 4th September 2017
Plasmonic and All-dielectric nanophotonics
Baranov, …, Evlyukhin, Chichkov Igor OZEROV
Optica, Vol. 4, Issue 7, pp. 814-825 (2017)
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Monday 4th September 2017
Dielectric photonics Resonant dielectric nanostructures Kuznetsov, Miroshnichenko, Brongersma, Kivshar & Luk’yanchuk, Science 2016
Mie resonances of a spherical particle
Igor OZEROV
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Monday 4th September 2017
Materials for dielectric photonics Crystalline and amorphous Silicon n~3.5 in the visible and near IR range Low losses Cheap Robust Chemically stable Compatible with microelectronic processing Igor OZEROV
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Monday 4th September 2017
Amorphous Si resonators
Advanced Optical Materials, 3, 1280–1286, Septembre 2015 Igor OZEROV
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Monday 4th September 2017
Nanofabrication of silicon structures (or Ni for RIE)
WET ALCALINE or PLASMA RIE Igor OZEROV
Control of the nanostructure shape and size
Summer School on Plasmonics 4
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Monday 4th September 2017
Crystalline silicon nanostructures KOH or TMAH ? KOH {110}>{100}>{111}
TMAH {100}>{110}>{111}
Selective chemical etching, Cr/Au mask J. Proust, F. Bedu, S. Chenot, I. Soumahoro, I. Ozerov, B. Gallas, R. Abdeddaim, and N. Bonod, Advanced Optical Materials, vol. 3, pp. 1280-1286, 2015. Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Crystalline silicon nanostructures Alcaline etching
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Crystalline silicon nanostructures Alcaline etching
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Scattering from individual Si particles D i a m e t e r
2015 Proust, Bedu, Chenot, Soumahoro, Ozerov, Gallas, Abdeddaim, and Bonod Igor OZEROV
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Monday 4th September 2017
Colometry (amorphous silicon)
Igor OZEROV
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Monday 4th September 2017
Scattering from individual Si cylinders
Igor OZEROV
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Monday 4th September 2017
Amorphous silicon structures for nanoscale painting Dark Field Microscopy 500 x 500µm
d=130nm d=100nm d=70nm d=210nm no structures
Piet Mondrian (1872-1944)
Igor OZEROV
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Monday 4th September 2017
Edvard Munch, The scream (1863–1944)
2017
Igor OZEROV
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Flauraud, Reyes, Paniagua-Domínguez, Kuznetsov, and Brugger
Monday 4th September 2017
Black Silicon Antireflective Coating
2011 Spinelli, Verschuuren & Polman
2016 Proust, Fehrembach, Bedu, Ozerov & Bonod DOI: 10.1038/srep24947
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Black Silicon Antireflective Coating nanofabrication steps
DOI: 10.1038/srep24947
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Top-Down Approach Typical steps Deposition
Litho
Cleaning
Nanofabrication Etching
Carac terisation
Igor OZEROV
Summer School on Plasmonics 4
Porquerolles
Monday 4th September 2017
All-dielectric zero-index optical metamaterial from λ = 1432 nm to 1457 nm the permittivity is negative but the permeability remains positive
electron-beam lithography, and RIE were used to structure the multilayer film Igor OZEROV Summer School on Plasmonics 4 Porquerolles Monday 4th September 2017
Nanoimprint Lithography Fabrication of master stamp
The resist is cured with UV light or thermally
The remaining resist should be etched by RIE Jung and Byun Biomed Eng Lett (2011) 1:153-162 Igor OZEROV
Summer School on Plasmonics 4
Porquerolles
Monday 4th September 2017
Nano- et micro- fabrication approaches
Igor OZEROV
Top-Down
Bottom-Up
micromachining from bulk to nano
growth and assembly of nano-objets
Summer School on Plasmonics 4
Porquerolles
Monday 4th September 2017
Nanosphere Lithography
D. Ingert, 2007
Igor OZEROV
Summer School on Plasmonics 4
Porquerolles
Monday 4th September 2017
Bead self-assembly strategies drop-coating
dip-coating
spin-coating
electrophoretic deposition
transfer from the gas/liquid to the gas/solid interface
self-assembly at the gas/liquid interface Ye and Qi, Nano Today (2011) 6, 608—631 Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Nanosphere Lithography Evaporation Lift-off Silver Gold Nickel Aluminum
Jörg Linder SPIE 10.1117/2.1201310.005154
Y. Song, H.E. Elsayed-Ali / AppliedSurfaceScience 256 (2010) 5961–5967 Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Tuning pit-size with Al thickness
Sputtering & Lift-off Pi, Dillard, Alameddine, Benard, Wahl, Ozerov, Charrier, Limozin, Sengupta, Nano Letters, 15, 5178−5184 (2015) Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Nanosphere Lithography
Etching of Gold Igor OZEROV
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Monday 4th September 2017
Fabrication of nanopillars by nanosphere lithography
Deep Etching of Silicon Cheung et al. Nanotechnology 17 (2006) 1339–1343
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Laser Generation and Printing of Gold Nanoparticles
Barchanski, Evlyukhin, Koroleva, Reinhardt, Sajti, Zywietz and Chichkov 2014
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Laser Generation and Printing of Silicon Nanoparticles
Barchanski, Evlyukhin, Koroleva, Reinhardt, Sajti, Zywietz and Chichkov 2014
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Photopolymerisation direct laser writing in photoresists
geometric phase optical elements
Wang et al. Appl. Phys. Lett. 110, 181101 (2017) Igor OZEROV
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Monday 4th September 2017
Laser-assisted fabrication of 3D chiral microstructures
Scalebar 2µm J. Ni et al. Light: Science & Applications (2017) 6, e17011 Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Laser-assisted fabrication of 3D chiral microstructures
Scalebar 5µm
J. Ni et al. Light: Science & Applications (2017) 6, e17011 Igor OZEROV
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Monday 4th September 2017
Mode sorter for vortex beams produced by 3D laser printing
LIGHTMAN et al., Optica 4 (2017) 605
Scalebar 25µm
S. Lightman et al. Optica (2017) 4, 6051 Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Nanomanufacturing
Imboden and Bishop, Top-down nanomanufacturing, Physics Today 67, 45 (2014) Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017
Conclusions Nanofabrication deals with Precision Resolution Process Speed Area to be treated Cost 2D layer by layer or 3D direct writing
Sometimes low-cost bottom-up methods give excellent results
Igor OZEROV
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Acknowledgements
Frédéric BEDU
Yeon Ui LEE
Igor OZEROV
Benjamin DEMIRDJIAN
Jeong Weon WU
Summer School on Plasmonics 4
Julien PROUST
Nicolas BONOD
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Thank you for your attention!
Igor OZEROV
Summer School on Plasmonics 4
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Monday 4th September 2017