Metrology of optically-unresolved features using ... - ZYGO

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Metrology of optically-unresolved features using ... - ZYGO

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Metrology of optically-unresolved features using interferometric surface profiling and. RCWA modeling. Peter de Groot,* Xavier Colonna de Lega, Jan Liesener, ...

Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling Peter de Groot,* Xavier Colonna de Lega, Jan Liesener, and Michael Darwin Zygo Corporation, Laurel Brook Road, Middlefield, CT 06457 * Corresponding author: [email protected]

Abstract: Rigorous coupled wave analysis (RCWA) interprets 3D whitelight interference microscopy profiles and reveals the dimensions of optically-unresolved surface features. Measurements of silicon etch depth of a 450-nm pitch grating structure correlate to atomic force microscopy with R2= 0.995 and a repeatability of 0.11nm. This same technique achieves a